Publication detail

Single layer and multilayered films of plasma polymers analyzed by nanoindentation and spectroscopic ellipsometry

ČECH, V. ČECHALOVÁ, B. TRIVEDI, R. STUDÝNKA, J.

Original Title

Type

journal article - other

Language

English

Original Abstract

Well-defined single layer and multilayered a-SiC:H films, deposited from tetravinylsilane at different powers by plasma-enhanced chemical vapor deposition on silicon, were intensively studied by in situ spectroscopic ellipsometry, nanoindentation, and atomic force microscopy. A realistic model of the sample structure was used to analyze ellipsometric data and distinguish individual layers in the multilayered film, evaluate their thickness and optical constants. Dispersion dependences for the refractive index were well separated for each type of individual layer, if the thickness was decreased 315 - 25 nm, and corresponded to those of the single layer. A beveled section of the multilayered film revealed the individual layers that were investigated by atomic force microscopy and nanoindentation to confirm that mechanical properties in multilayered and single layer films are similar.

Keywords

Multilayers; Plasma processing and deposition; Ellipsometry; Atomic force microscopy (AFM)

Authors

ČECH, V.; ČECHALOVÁ, B.; TRIVEDI, R.; STUDÝNKA, J.

RIV year

2009

Released

22. 12. 2009

ISBN

0040-6090

Periodical

Thin Solid Films

Year of study

517

Number

State

Kingdom of the Netherlands

Pages from

6034

Pages to

6037

Pages count

BibTex

@article{BUT47020,
  author="Vladimír {Čech} and Božena {Čechalová} and Rutul Rajendra {Trivedi} and Jan {Studýnka}",
  title="Single layer and multilayered films of plasma polymers analyzed by nanoindentation and spectroscopic ellipsometry",
  journal="Thin Solid Films",
  year="2009",
  volume="517",
  number="21",
  pages="6034--6037",
  issn="0040-6090"
}