Publication detail

A study of Ga layers on Si(100)-(2x1) by SR-PES: influence of adsorbed water

ČECHAL, J. MACH, J. VOBORNÝ, S. KOSTELNÍK, P. BÁBOR, P. SPOUSTA, J. ŠIKOLA, T.

Original Title

Type

journal article - other

Language

English

Original Abstract

Results for deposition and thermal annealing of gallium on the Si(100)-(2x1) surface achieved by synchrotron radiation photoelectron spectroscopy (SR-PES) and low energy electron diffraction (LEED) are presented. In addition to deposition of Ga on a clean surface, the influence of water adsorption on the arrangement of gallium atoms was also studied. The results on Ga deposition at a higher temperature (490 C) are consistent with a Ga ad-dimer model showing equivalent bond arrangement of all Ga atoms for coverages up to 0.5 ML. The deposition onto a surface with adsorbed water at room temperature led to a disordered gallium growth. In this case gallium atoms bind to silicon dimers already binding fragments of adsorbed water. A subsequent annealing of these layers leads to a surface structure similar to the Ga-(2x2), however, it is less ordered, probably due to the presence of silicon oxides formed from water fragments.

Keywords

Gallium; Ga; Silicon; Si(100); Water; Surface structure; Low energy electron diffraction (LEED); Synchrotron radiation photoelectron spectroscopy

Authors

ČECHAL, J.; MACH, J.; VOBORNÝ, S.; KOSTELNÍK, P.; BÁBOR, P.; SPOUSTA, J.; ŠIKOLA, T.

RIV year

2007

Released

1. 5. 2007

ISBN

0039-6028

Periodical

Surface Science

Year of study

601

Number

State

Kingdom of the Netherlands

Pages from

2047

Pages to

2053

Pages count

BibTex

@article{BUT43424,
  author="Jan {Čechal} and Jindřich {Mach} and Stanislav {Voborný} and Petr {Kostelník} and Petr {Bábor} and Jiří {Spousta} and Tomáš {Šikola}",
  title="A study of Ga layers on Si(100)-(2x1) by SR-PES: influence of adsorbed water",
  journal="Surface Science",
  year="2007",
  volume="601",
  number="9",
  pages="2047--2053",
  issn="0039-6028"
}