Publication detail
Influence of Zinc Vapor on the Post-Discharge in Pure Nitrogen
KRČMA, F. BOCKOVÁ, I. HRDLIČKA, A. KANICKÝ, V. KRÁSENSKÝ, P.
Original Title
Influence of Zinc Vapor on the Post-Discharge in Pure Nitrogen
Type
abstract
Language
English
Original Abstract
The post-discharge of pure nitrogen is subject of many studies during many years. The influence of various impurities and traces on the post-discharge kinetics was studied extensively mainly during the last a few years. Besides the oxygen and carbon containing impurities the observation of mercury atoms influence was observed. The presented work shows the first results obtained in the pure nitrogen containing zinc. The DC flowing afterglow Pyrex reactor was used for this study. The zinc vapour vas introduced into the pure nitrogen flow just before the active discharge. The first easily visible effect was strong quenching of the nitrogen pink afterglow effect. The detail study shows significant changes in the vibrational populations of neutral nitrogen B ^3Pi_g and C ^3Pi_u states as well as in the molecular ion B ^2Sigma state. The emission of zinc atomic lines was observed not only in an active discharge but some of lines were also well visible during the afterglow up to 60 ms that was a limit for the study. The kinetic model shows that the upper states of these lines are populated by energy transfer from the vibrationally excited nitrogen ground state.
Keywords
nitrogen post discharge, post-discharge kinetics, zinc vapor
Authors
KRČMA, F.; BOCKOVÁ, I.; HRDLIČKA, A.; KANICKÝ, V.; KRÁSENSKÝ, P.
RIV year
2009
Released
23. 4. 2009
Publisher
AV ČR
Location
Praha
ISBN
978-80-87351-00-0
Book
Proceedings of 7th EU-Japan Joint Symposium on Plasma Processing
Pages from
36
Pages to
36
Pages count
1
BibTex
@misc{BUT33070,
author="František {Krčma} and Ivana {Bocková} and Aleš {Hrdlička} and Viktor {Kanický} and Pavel {Krásenský}",
title="Influence of Zinc Vapor on the Post-Discharge in Pure Nitrogen",
booktitle="Proceedings of 7th EU-Japan Joint Symposium on Plasma Processing",
year="2009",
pages="36--36",
publisher="AV ČR",
address="Praha",
isbn="978-80-87351-00-0",
note="abstract"
}