Publication detail

Fragmentation of Tetravinyl Silane in Pulsed RF Discharge

KRČMA, F. FLAMÍKOVÁ, K. STUDÝNKA, J.

Original Title

Type

conference paper

Language

English

Original Abstract

The tetravinylsilane fragmentation was studied in pulsed regime of RF discharge by optical emission spectroscopy. Some simple fragments were recognized. The emission intensities of these fragments were strongly dependent on the duty cycle of the discharge. The electron and rotational temperatures were calculated from the spectra and both of them also depended on the duty cycle. The determined electron temperature of about 3500 K was very low in comparison to the energy needed for the tetravinylsilane fragmentation (about 10 eV) and only a few electrons had sufficient energy for the fragmentation. Thus we suppose that excited states play a significant role in the fragmentation process.

Keywords

pulsed RF discharge, tetravinylsilane, fragmentation, optical emission spectroscopy

Authors

KRČMA, F.; FLAMÍKOVÁ, K.; STUDÝNKA, J.

RIV year

2009

Released

17. 1. 2009

Publisher

UK Bratislava

Location

Bratislava

ISBN

978-80-89186-45-7

Book

Proceedings of 17th Symposium on Application of Plasma Processes

Pages from

285

Pages to

286

Pages count

BibTex

@inproceedings{BUT29624,
  author="František {Krčma} and Kristýna {Flamíková} and Jan {Studýnka}",
  title="Fragmentation of Tetravinyl Silane in Pulsed RF Discharge",
  booktitle="Proceedings of 17th Symposium on Application of Plasma Processes",
  year="2009",
  pages="285--286",
  publisher="UK Bratislava",
  address="Bratislava",
  isbn="978-80-89186-45-7"
}