Publication detail
Thin Plasma Polymer Films Of Hexamethyldisiloxane
ČECH, V. PŘIKRYL, R. SALYK, O.
Original Title
Thin Plasma Polymer Films Of Hexamethyldisiloxane
Type
conference paper
Language
English
Original Abstract
Plasma enhanced chemical vapor technology was used to prepare thin polymer film from a vapor of hexamethyldisiloxane (HMDSO) monomer. An influence of deposition conditions on properties of films was observed. Plasma processes were diagnosticated employing the mass spectroscopy. Chemical composition and structure of prepared layers were studied by the infrared spectroscopy (FTIR) and the electron spectroscopy for chemical analysis (ESCA). Surface morphology of films was observed by the scanning electron microscopy (SEM), the profilometer Talystep and the atomic force microscopy (AFM). We measured the surface energy, evaluated the thermal stability using thermogravimetric analysis together with the mass spectroscopy and investigated an adhesion of films to substrates. Some mechanical properties were tested as well.
Keywords
thin film, plasma polymerization
Authors
ČECH, V.; PŘIKRYL, R.; SALYK, O.
RIV year
2000
Released
30. 6. 2000
Publisher
UK Praha
Location
Praha
ISBN
80-85863-59-6
Book
Proceedings of WDS 2000
Pages from
318
Pages to
321
Pages count
4
BibTex
@inproceedings{BUT2561,
author="Vladimír {Čech} and Ota {Salyk} and Radek {Přikryl}",
title="Thin Plasma Polymer Films Of Hexamethyldisiloxane",
booktitle="Proceedings of WDS 2000",
year="2000",
pages="4",
publisher="UK Praha",
address="Praha",
isbn="80-85863-59-6"
}