Publication detail

Capacitive coupling plasma system for thin film deposition

Přikryl, R., Čech, V., Hedbavny, P.

Original Title

Type

conference paper

Language

English

Original Abstract

Plasma polymerization is a powerful tool for deposition of thin films whose physicochemical properties can be controlled in wide ranges and thus the technology enables tailoring of the material with respect to an application. However, a success of the coating technique depends on a suitable technological system, as the vacuum quality and film reproducibility are the crucial parameters. We have developed a new capacitive coupling system for creative design and application of complex film systems in smart materials. The internal setup of our deposition chamber using plan-parallel electrodes was derived from a typical capacitive coupling system, but our apparatus was equipped with many non-standard components.

Keywords

PECVD, plasma technology, capacitive coupling system

Authors

Přikryl, R., Čech, V., Hedbavny, P.

RIV year

2004

Released

1. 1. 2004

Location

Itálie

Pages from

Pages to

Pages count

BibTex

@inproceedings{BUT17610,
  author="Radek {Přikryl} and Vladimír {Čech} and Pavel {Hedbavny}",
  title="Capacitive coupling plasma system for thin film deposition",
  booktitle="1st Workshop {"}Structuring of Polymers{"}",
  year="2004",
  pages="96--97",
  address="Itálie"
}