Publication detail

Chemical properties of plasma-polymerized vinyltriethoxysilane

ČECH, V., ZEMEK, J., PEŘINA, V., VANĚK, J.

Original Title

Type

conference paper

Language

English

Original Abstract

Plasma-polymerized thin films of vinyltriethoxysilane were deposited on IR-transparent silicon wafers using plasma-enhanced chemical vapor deposition. Deposited films were characterized by spectroscopic techniques (RBS, ERDA, XPS, FTIR) in order to compare their elemental composition and chemical structure. We were able to influence/control the elemental composition and chemical structure of the plasma polymer films in relatively wide ranges by increasing the effective power.

Keywords

PE CVD; thin film; organosilicon; FTIR; RBS; ERDA; XPS

Authors

ČECH, V., ZEMEK, J., PEŘINA, V., VANĚK, J.

RIV year

2005

Released

1. 8. 2005

Publisher

Conference Management, Toronto

Location

Toronto, Kanada

Pages from

Pages to

Pages count

BibTex

@inproceedings{BUT16049,
  author="Vladimír {Čech} and Jan {Vaněk} and Vratislav {Peřina} and Josef {Zemek}",
  title="Chemical properties of plasma-polymerized vinyltriethoxysilane",
  booktitle="Proc. 17th International Symposium on Plasma Chemistry",
  year="2005",
  pages="1--5",
  publisher="Conference Management, Toronto",
  address="Toronto, Kanada"
}