Publication detail

Layered a-CSi:H/a-CSiO:H nanocomposites

BRÁNECKÝ, M. ČECH, V.

Original Title

Type

abstract

Language

English

Original Abstract

Layered nanocomposites with a controlled distribution of mechanical properties across the nanostructure were constructed from oxygen-free (a-CSi:H) and oxygen-bound (a-CSiO:H) individual layers. These were deposited at different power from pure tetravinylsilane and tetravinylsilane in a mixture with oxygen gas using plasma-enhanced chemical vapor deposition operating in pulsed mode. Dynamic nanoindentation (Modulus Mapping) was employed to characterize the distribution of mechanical properties across the layered nanocomposites. XPS depth profiling using argon gas cluster ion beams was used to determine the atomic concentration of carbon, silicon, and oxygen in the individual layers forming the nanocomposite. The high energy-resolution XPS spectra (C 1s, Si 2p, and O 1s) were analyzed to gain more insight into bonding species formed in layered nanocomposite.

Keywords

Layered nanocomposite; mechanical properties; chemical properties; PECVD

Authors

BRÁNECKÝ, M.; ČECH, V.

Released

14. 11. 2019

Location

Luxembourg

Pages count

BibTex

@misc{BUT160081,
  author="Martin {Bránecký} and Vladimír {Čech}",
  title="Layered a-CSi:H/a-CSiO:H nanocomposites",
  booktitle="6th International Plasma Science and Interfaces workshop
Luxembourg
",
  year="2019",
  pages="1",
  address="Luxembourg",
  note="abstract"
}