Detail publikace

Protection of Archaeological Artefacts by Deposition of Parylene and SiOx Thin Films

BALAŠTÍKOVÁ, R. PROCHÁZKA, M. MENČÍK, P. HORÁK, J. PŘIKRYL, R. KRČMA, F.

Originální název

Protection of Archaeological Artefacts by Deposition of Parylene and SiOx Thin Films

Typ

abstrakt

Jazyk

angličtina

Originální abstrakt

This contribution focuses on possibilities of the archaeological artefacts (copper, iron, brass and bronze) protection by a thin film deposition of SiOx and Parylene thin films. SiOx layers were deposited by PECVD in a low pressure reactor with capacitively coupled plasma discharge (13.56 MHz). Mixture of Hexamethyldisiloxane with oxygen was used as a precursor of plasmachemical reactions. The parylene thin films were prepared by standard CVD technique. The coatings were characterized by various methods in order to obtain information about their thickness (ellipsometry), chemical structure (FTIR) and elemental composition (XPS), surface morphology (LCSM, SEM) and barrier properties (OTR). Standard corrosion tests were performed to determine the effectiveness of corrosion protection. The results were compared with those on samples treated by conventional conservation procedures.

Klíčová slova

SiOx plasma deposition, parylene films, barriere properties

Autoři

BALAŠTÍKOVÁ, R.; PROCHÁZKA, M.; MENČÍK, P.; HORÁK, J.; PŘIKRYL, R.; KRČMA, F.

Vydáno

18. 6. 2012

Místo

Praha

ISSN

1805-7594

Periodikum

Symposium on Plasma Physics and Technology

Ročník

1

Číslo

1

Stát

Česká republika

Strany od

139

Strany do

139

Strany počet

1

BibTex

@misc{BUT93169,
  author="Radka {Veverková} and Michal {Procházka} and Přemysl {Menčík} and Jakub {Horák} and Radek {Přikryl} and František {Krčma}",
  title="Protection of Archaeological Artefacts by Deposition of Parylene and SiOx Thin Films",
  year="2012",
  journal="Symposium on Plasma Physics and Technology",
  volume="1",
  number="1",
  pages="139--139",
  address="Praha",
  issn="1805-7594",
  note="abstract"
}