Detail publikace

Spectroscopic Observation of Plasma Deposition of Thin Silane and Siloxane Based Films

RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.

Originální název

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

The spectroscopic studies have been focused on the basic characterization of the RF discharge conditions during the films deposition. In the discharge spectra many different species has been determined. To characterize the neutral gas temperature the small amount of nitrogen has been involved into the discharge. The dependencies of the temperature and the molecular excitations in the discharge have been initially studied on the total discharge power and gas composition. The correlation among the discharge parameters and the final layer properties will be subject of the following studies.

Klíčová slova

Low temperature plasma deposition, Optical emission spectroscopy

Autoři

RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.

Rok RIV

2003

Vydáno

1. 4. 2003

Nakladatel

Universita Bari

Místo

Bari

Strany od

214

Strany do

217

Strany počet

BibTex

@inproceedings{BUT8827,
  author="Zuzana {Rašková} and Hana {Šormová} and Iveta {Havelková} and František {Krčma} and Jan {Vaněk} and Radek {Přikryl} and Vladimír {Čech}",
  title="Spectroscopic Observation of Plasma Deposition of Thin Silane and Siloxane Based Films",
  booktitle="Proceedings of Frontiers in Low Temperature Plasma Diagnostics V",
  year="2003",
  number="1",
  pages="4",
  publisher="Universita Bari",
  address="Bari"
}