Detail publikace

Electron Ionization of Dimethylphenylsilane - Appearance Energies of Selected Ionic Fragments

KOČIŠEK, J. STRUŽÍNSKÝ, O. SAHÁNKOVÁ, H. KRČMA, F. MATEJČÍK, Š.

Originální název

Typ

článek v časopise - ostatní, Jost

Jazyk

angličtina

Originální abstrakt

Electron ionization (EI) to dimethylphenylsilane (DMPS) is studied in crossed electron-molecular beams experiment. Using this technique with improved energy resolution of the electron beam, the positive mass spectra and the relative partial cross sections for EI to DMPS are obtained. The ionization energy of DMPS of 9.04 +- 0.06eV and the threshold energies for dissociative ionization channels are estimated. The bond dissociation energies for single bond cleavage channels are also estimated on the basis of experimental observations. The detection of doubly charged ions of DMPS2+ (AE=26.3 +- eV) as well as several other doubly charged fragments is discussed in detail.

Klíčová slova

appearance energy;dimethylphenylsilane;electron ionization;organometallic vapour deposition;thin films

Autoři

KOČIŠEK, J.; STRUŽÍNSKÝ, O.; SAHÁNKOVÁ, H.; KRČMA, F.; MATEJČÍK, Š.

Rok RIV

2012

Vydáno

16. 3. 2012

ISSN

1612-8850

Periodikum

Plasma Processes and Polymers

Ročník

Číslo

Stát

Spolková republika Německo

Strany od

298

Strany do

303

Strany počet

BibTex

@article{BUT74088,
  author="Jaroslav {Kočišek} and Ondřej {Stružínský} and Hana {Sahánková} and František {Krčma} and Štefan {Matejčík}",
  title="Electron Ionization of Dimethylphenylsilane - Appearance Energies of Selected Ionic Fragments",
  journal="Plasma Processes and Polymers",
  year="2012",
  volume="9",
  number="3",
  pages="298--303",
  issn="1612-8850"
}