Detail publikace

PECVD of hexamethyldisiloxane: Pulsed mode

BLAHOVÁ, L. PROCHÁZKA, M. KRČMA, F.

Originální název

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

PECVD of hexamethyldisiloxane was performed in order to study dependence of the process on duty cycle. Capacitively coupled plasma was measured via optical emission spectroscopy. Experiment shows that dependence of fragment populations on duty cycle was increasing with increasing duty cycle in the case of constant supplied power, however, there was a maximum detected at 30 % in the case of constant mean power. This point might be an optimal setup for the deposition of SiO2 thin films from hexamethyldisiloxane.

Klíčová slova

Optical emission spectroscopy, Hexamethyldisiloxane, Thin film deposition

Autoři

BLAHOVÁ, L.; PROCHÁZKA, M.; KRČMA, F.

Vydáno

21. 8. 2011

Nakladatel

Fizicki fakultet Beograd

Místo

Beograd

ISBN

978-86-84539-08-5

Kniha

CESPC IV Book of Abstracts

Strany od

111

Strany do

112

Strany počet

BibTex

@inproceedings{BUT73654,
  author="Lucie {Janů} and Michal {Procházka} and František {Krčma}",
  title="PECVD of hexamethyldisiloxane: Pulsed mode",
  booktitle="CESPC IV Book of Abstracts",
  year="2011",
  pages="111--112",
  publisher="Fizicki fakultet Beograd",
  address="Beograd",
  isbn="978-86-84539-08-5"
}