Detail publikace
Photocatalytic Degradation of Formic Acid on TiO2 Thin Layers
CHOMOUCKÁ, J. DZIK, P. VESELÝ, M. DRBOHLAVOVÁ, J.
Originální název
Photocatalytic Degradation of Formic Acid on TiO2 Thin Layers
Typ
článek v časopise - ostatní, Jost
Jazyk
angličtina
Originální abstrakt
TiO2 thin films were deposited onto borosilicate glass plates by sol-gel technique using dip-coating and printing methods. Formic acid (FA) was choosen because of simple mechanism of degradation: it undergoes direct mineralisation to CO2 and H2O without the formation of any stable intermediate species. Moreover, it also represents a possible final step in the photodegradation of more complex organic compounds. Photocatalytic activity was evaluated by examining the oxidation rate of formic acid aqueous solution upon UV irradiation in a pyrex cylindric reactor. HPLC analysis was used for detection of FA concentration. The obtained values of initial reaction rate for various FA initial concentrations were treated using Lagmuir-Hinshelwood model. The influence of TiO2 layer number (dip-coating method) and the value of TiO2 dot area (printing method) on the rate of FA photocatalytic degradation were tested.
Klíčová slova
photoctalytic degradation, formic acid
Autoři
CHOMOUCKÁ, J.; DZIK, P.; VESELÝ, M.; DRBOHLAVOVÁ, J.
Rok RIV
2008
Vydáno
9. 9. 2008
Nakladatel
ČSCH
Místo
Praha
ISSN
1213-7103
Periodikum
Chemické listy
Ročník
102
Číslo
15
Stát
Česká republika
Strany od
s986
Strany do
s988
Strany počet
3
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