Detail publikace

Plasma polymerisation of methylphenylsilane

SALYK, O. BROŽA, P. DOKOUPIL, N. HERRMANN, R. KUŘITKA, I. PRYČEK, J. WEITER, M.

Originální název

Plasma polymerisation of methylphenylsilane

Typ

článek v časopise - ostatní, Jost

Jazyk

angličtina

Originální abstrakt

Microwave electron cyclotron resonance plasma afterglow chemical vapour deposition (MW ECR PA CVD) and radio frequency plasma enhanced CVD (RF PE CVD) of plasma-poly(methylphenylsilane) (p-PMPS) were examined according to plasma composition and resulting thin film properties. Direct mass spectrometry monitoring and gas chromatography and mass spectroscopy (GC MS) of cold-trapped plasma products were used. Deposited samples were measured mainly on luminescence. The low pressure MW ECR plasma creates species for layer growth by a smaller average number of inelastic collisions per origin of monomer molecule. The exploitation of monomer reaches 23% in comparison with RF plasma and the deposition rate is larger in comparison with RF plasma . The inelastic collision rate is primarily more important for growing layers than the power introduced into plasma. The luminescence spectra of both MW and RF samples are compared.

Klíčová slova

Polysilane; PMPS; Plasma deposition; Mass spectroscopy

Autoři

SALYK, O.; BROŽA, P.; DOKOUPIL, N.; HERRMANN, R.; KUŘITKA, I.; PRYČEK, J.; WEITER, M.

Rok RIV

2005

Vydáno

27. 9. 2005

Nakladatel

Elsevier

Místo

London

ISSN

0257-8972

Periodikum

Surface and Coatings Technology

Ročník

200

Číslo

1-4

Stát

Švýcarská konfederace

Strany od

486

Strany do

489

Strany počet

4

BibTex

@article{BUT46370,
  author="Ota {Salyk} and Pavel {Broža} and Norbert {Dokoupil} and Radim {Herrmann} and Ivo {Kuřitka} and Jiří {Pryček} and Martin {Weiter}",
  title="Plasma polymerisation of methylphenylsilane",
  journal="Surface and Coatings Technology",
  year="2005",
  volume="200",
  number="1-4",
  pages="486--489",
  issn="0257-8972"
}