Detail publikace

Spectroscopic Monitoring of Plasma Deposition of Silane and Siloxane Based Thin Films

RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.

Originální název

Typ

článek v časopise - ostatní, Jost

Jazyk

angličtina

Originální abstrakt

The spectroscopic studies have been focused on the basic characterization of the RF discharge conditions during the films deposition. In the discharge spectra many different species has been determined. To characterize the neutral gas temperature the small amount of nitrogen has been involved into the discharge. The dependencies of the temperature and the molecular excitations in the discharge have been initially studied on the total discharge power and gas composition. The correlation among the discharge parameters and the final layer properties will be subject of the following studies.

Klíčová slova

Plasma deposition, organosilicone layers, optical emission spectroscopy

Autoři

RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.

Rok RIV

2003

Vydáno

1. 9. 2003

Nakladatel

Sloveská Akadémia Ved

Místo

Bratislava

ISSN

0323-0465

Periodikum

Acta Physica Slovaca

Ročník

Číslo

Stát

Slovenská republika

Strany od

401

Strany do

405

Strany počet

BibTex

@article{BUT41506,
  author="Zuzana {Rašková} and Hana {Šormová} and Iveta {Havelková} and František {Krčma} and Jan {Vaněk} and Radek {Přikryl} and Vladimír {Čech}",
  title="Spectroscopic Monitoring of Plasma Deposition of Silane and Siloxane Based Thin Films",
  journal="Acta Physica Slovaca",
  year="2003",
  volume="53",
  number="5",
  pages="5",
  issn="0323-0465"
}