Detail publikace

Preparation of (001) preferentially oriented titanium thin films by ion-beam sputtering deposition on thermal silicon dioxide

GABLECH, I. SVATOŠ, V. CAHA, O. HRABOVSKÝ, M. PRÁŠEK, J. HUBÁLEK, J. ŠIKOLA, T.

Originální název

Preparation of (001) preferentially oriented titanium thin films by ion-beam sputtering deposition on thermal silicon dioxide

Typ

článek v časopise ve Web of Science, Jimp

Jazyk

angličtina

Originální abstrakt

We propose the ion-beam sputtering deposition providing Ti thin films of desired crystallographic orientation and smooth surface morphology not obtainable with conventional deposition techniques such as magnetron sputtering and vacuum evaporation. The sputtering was provided by argon broad ion beams generated by a Kaufman ion-beam source. In order to achieve the optimal properties of thin film, we investigated the Ti thin films deposited on an amorphous thermal silicon dioxide using X-ray diffraction, and atomic force microscopy. We have optimized deposition conditions for growing of thin films with the only (001) preferential orientation of film crystallites, and achieved ultra-low surface roughness of 0.55 nm. The deposited films have been found to be stable upon annealing up to 300 °C which is often essential for envisaging subsequent deposition of piezoelectric AlN thin films.

Klíčová slova

Ion-beam sputtering deposition, Kaufman ion-beam source, titanium, thin film, (001) preferential orientation, surface roughness, XRD, AFM

Autoři

GABLECH, I.; SVATOŠ, V.; CAHA, O.; HRABOVSKÝ, M.; PRÁŠEK, J.; HUBÁLEK, J.; ŠIKOLA, T.

Vydáno

1. 4. 2016

Nakladatel

Springer US

Místo

New York

ISSN

0022-2461

Periodikum

Journal of Materials Science

Ročník

51

Číslo

7

Stát

Spojené státy americké

Strany od

3329

Strany do

3336

Strany počet

8

URL

http://link.springer.com/article/10.1007/s10853-015-9648-y

Plný text v Digitální knihovně

http://hdl.handle.net/11012/203130

BibTex

@article{BUT118989,
  author="Imrich {Gablech} and Vojtěch {Svatoš} and Ondřej {Caha} and Miloš {Hrabovský} and Jan {Prášek} and Jaromír {Hubálek} and Tomáš {Šikola}",
  title="Preparation of (001) preferentially oriented titanium thin films by ion-beam sputtering deposition on thermal silicon dioxide",
  journal="Journal of Materials Science",
  year="2016",
  volume="51",
  number="7",
  pages="3329--3336",
  doi="10.1007/s10853-015-9648-y",
  issn="0022-2461",
  url="http://link.springer.com/article/10.1007/s10853-015-9648-y"
}